CVD Process Gases for Semiconductors

We are commercializing tungsten hexafluoride (WF₆) which is used to mold metal wiring and trimethylsilane (3MS) which is used to form low-k dielectric constant interlayer insulating coating.

Cleaning Gases for Semiconductors Manufacturing Equipment

Since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of chlorine trifluoride (ClF₃) and other cleaning gases for semiconductors manufacturing equipment.

Etching Gases for Next Generation Semiconductors

CEG® is the brand name for Central Glass' innovative process gases for semiconductors. In the CEG® Series, we have commercialized various process gases that have a lower environmental impact than existing gases and are suitable for 3D devices and cutting-edge materials.

Pattern Keeper™ (Pattern Collapse Prevention Agent)

A chemical solution with high water repellency created by our proprietary technology. Prevents pattern collapse by providing the surface of a semiconductor pattern with this same characteristic of water repellence, which is a major problem during the drying process after wet cleaning.

Photoresist Materials

We supply a variety of fluorine-containing monomers and polymers.

Photo-curable Resins

We provide photo-curable resins for semiconductors and displays that utilize our fluorine technology, which have features such as liquid repellency, low refractive index, and transparency. (R&D products)

Other Fluorine Products

Unique fluorine resins and fluorine compound products.