Products

Cleaning Gases for Semiconductors Manufacturing Equipment

Since completing a multi-purpose manufacturing facility for high-purity fluorine gases in 1988, we have consolidated our position as a major supplier of chlorine trifluoride (ClF₃) and other cleaning gases for semiconductors manufacturing equipment.

ClF₃

The product is used as a LP-CVD chamber cleaning gas targeting TiN and W.

Purity 99.9% or more

Applications

  • LP-CVD chamber cleaning gas

20% F2/N2

The product is used as a LP-CVD chamber cleaning gas targeting Si.

Purity

F2: 99.9% or more

N2: 99.999% or more

Applications

  • LP-CVD chamber cleaning gas

High purity anhydrous hydrofluoric acid (HF)

The product is used as a LP-CVD chamber high performance cleaning gas targeting SiO2.

Purity

99.999% or more

Applications

  • Etching gas, LP-CVD chamber and exhaust pipe cleaning gas

Electronic Materials Related Products

Electronic Materials Related Research and Development

Contact

Online inquiries

Telephone inquiries

Electronic Materials Sales Department
Business hours: 9:00 a.m. - 5:30 p.m.

※Except Saturdays, Sundays, public holidays, August 15, and seasonal holiday periods.