Products

Etching Gases for Next Generation Semiconductors

CEG® is the brand name for Central Glass' innovative process gases for semiconductors.
In the CEG® Series, we have commercialized various process gases that have a lower environmental impact than existing gases and are suitable for 3D devices and cutting-edge materials.

CEG® 34E

Compared to existing etching gases (C4F6, C4F8, etc.), CEG® 34E can etch SiO2 or SiN films with high selectivity against mask materials such as amorphous carbon.

Purity 99.99% or more

Applications

  • 3D-NAND SiO2/SiN multilayer etching
  • SiO2 or SiN film deep etching
  • Removal of SiN sacrificial layer

CEG® 39A

An etching gas compatible with GAA structures for the 2nm generation and beyond, achieving high selectivity and fast processing with significantly reducing environmental impact.

Purity 99.99% or more

Applications

  • Etching for cutting-edge devices

CEG® ClF3

ClF3, which has until now been used as a cleaning gas, has been customized to high purity for use as an etching gas.

Purity 99.99% or more

Applications

  • Etching for cutting-edge devices

CEG® IF7

It is possible to etch silicon films with high selectivity compared to SiO2 and SiN films.

Purity 99.95% or more

Applications

  • Removal of Poly-Si dummy gate
  • Removal of Si hard mask
  • Si sacrificial layer etching

Ultra high purity anhydrous hydrofluoric acid (HF)

This product is a customized version of high purity anhydrous hydrofluoric acid (HF), which has so far been used as a cleaning gas, for use as an etching gas.

20%F2/ Ar

This is a next-generation environmentally friendly etching gas. Compared to existing NF3 and CF-based gases, the environmental impact can be reduced.

Electronic Materials Related Products

Electronic Materials Related Research and Development

Contact

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Electronic Materials Sales Department
Business hours: 9:00 a.m. - 5:30 p.m.

※Except Saturdays, Sundays, public holidays, August 15, and seasonal holiday periods.