Products

Etching Gases for Next Generation Semiconductors

CEG® is the brand name for Central Glass' innovative process gases for semiconductors.
In the CEG® Series, we have commercialized various process gases that have a lower environmental impact than existing gases and are suitable for 3D devices and cutting-edge materials.

CEG® ClF3

ClF3, which has until now been used as a cleaning gas, has been customized to high purity for use as an etching gas.

Purity 99.99% or more

Applications

  • Etching for cutting-edge devices

CEG® 34E

Compared to existing etching gases (C4F6, C4F8, etc.), CEG®34E can etch SiO2 or SiN films with high selectivity against mask materials such as amorphous carbon.

Purity 99.99% or more

Applications

  • 3D-NAND SiO2/SiN multilayer etching
  • SiO2 or SiN film deep etching
  • Removal of SiN sacrificial layer

CEG® 16N

When used as an additive gas during etching, it can greatly improve the selectivity of SiO2 film for mask materials such as amorphous carbon compared to existing etching gases (C4F6, C4F8, etc.).

Purity 99.99% or more

Applications

  • 3D-NAND SiO2/SiN multilayer etching
  • SiO2 film deep etching

CEG® 31Y

Highly selective etching of SiO2 film is possible for mask materials such as amorphous carbon. It is also possible to improve the morphology of the mask material by using it as an additive gas during etching.

Purity 99.99% or more

Applications

  • SiO2 film deep etching
  • Improves morphology of mask material during etching

CEG® IF7

It is possible to etch silicon films with high selectivity compared to SiO2 and SiN films.

Purity 99.95% or more

Applications

  • Removal of Poly-Si dummy gate
  • Removal of Si hard mask
  • Si sacrificial layer etching

Ultra high purity anhydrous hydrofluoric acid (HF)

This product is a customized version of high purity anhydrous hydrofluoric acid (HF), which has so far been used as a cleaning gas, for use as an etching gas.

20%F2/ Ar

This is a next-generation environmentally friendly etching gas. Compared to existing NF3 and CF-based gases, the environmental impact can be reduced.

Electronic Materials Related Products

Electronic Materials Related Research and Development

Contact

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Telephone inquiries

Electronic Materials Sales Department
Business hours: 9:00 a.m. - 5:30 p.m.

※Except Saturdays, Sundays, public holidays, August 15, and seasonal holiday periods.